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Inductively Coupled Plasma Reactive Ion Etch with Deep Reactive Ion Etch
Description
Oregon State University intends to contract for the provision of a Inductively Coupled Plasma Reactive Ion Etch with Deep Reactive Ion Etch (ICPRIE/DRIE) from Oxford Instruments as a sole source because of its ability to meet compatibility requirements of an existing line of equipment and the manufacturer being the sole distributor of the goods. The specifications for the Cryogenic etch are:
The ICPRIE/DRIE must be compatible with the existing Oxford Instruments PlasmaPro 100 Cobra 380 (PP100 platform) currently in use at OSU.
Lifetime recipe support for existing and newly developed processes is required, which is an irreplaceable factor for the success of this tool near term and in the future.
A manufacturer must have demonstrated expertise in plasma processing, and a high probability of being positioned to provide tool support over the expected service life of the tool.
Cryogenic etch capability with no hardware changes required.
Required specifications:
• Cobra300 3kW ICP plasma etch source (inc RF generator & amu)
• RF 300W generator & amu match for ETCH
• LF 300 generator bias kit
• Gas dispersion plate for ICP plasma source
• 100mT CM gauge
• Cryo-cooled / electrically-heated etch lower electrode kit
• Wafer clamping and helium backing kit
• SMC HRZ010 chiller
o 10m chiller cable
• LN2 / Fluid / Heat Auto Changeover Unit
• 2x Non-hazardous gas line & mfc for use in a close coupled gas pod
• Standard Gas Pod externally mounted (8 lines max)
• 4x Standard gasline and MFC for non-hazardous gases
• Gas pod wall mounted
o 10m gas pod power cable
• Adixen ATH1600MT turbo
• ISO200 pipework
• Automatic Pressure Control & heated backing valve kit
• Pfeiffer A124H ELT pump kit
o 10m pump cable
• Chamber and pump down pipe Heating Kit
• PlasmaPro 100 Pumping Foreline Heating Kit
• PlasmaPro100 Single loadlock kit
• Roughing only to Dry Pump - Isolation Valve included
o Pfeiffer ACP15G dry pump kit
• PlasmaPro 100 ICP Etch system
o 208V 60Hz 3phase supply configuration
o 10m process chamber cable
• PC & 22" monitor
• Chamber right hand build configuration
• UL build compliance (3rd Party Certification quoted separately)
Oxford Instruments is the sole manufacturer and distributor of the equipment and uses proprietary technology to integrate with existing equipment at OSU.
An entity may appeal this determination in accordance with OSU Standard 03-010. Section 5.17 no later than the closing date indicated on the website. Appeals must be submitted to Procurement, Contracts and Materials Management at procurement@oregonstate.edu by Friday, March 28, 2025 at 3:30 pm, PST. For additional information please contact Brian Kinsey by email at brian.kinsey@oregonstate.edu or by telephone at (541) 737-1027.
The ICPRIE/DRIE must be compatible with the existing Oxford Instruments PlasmaPro 100 Cobra 380 (PP100 platform) currently in use at OSU.
Lifetime recipe support for existing and newly developed processes is required, which is an irreplaceable factor for the success of this tool near term and in the future.
A manufacturer must have demonstrated expertise in plasma processing, and a high probability of being positioned to provide tool support over the expected service life of the tool.
Cryogenic etch capability with no hardware changes required.
Required specifications:
• Cobra300 3kW ICP plasma etch source (inc RF generator & amu)
• RF 300W generator & amu match for ETCH
• LF 300 generator bias kit
• Gas dispersion plate for ICP plasma source
• 100mT CM gauge
• Cryo-cooled / electrically-heated etch lower electrode kit
• Wafer clamping and helium backing kit
• SMC HRZ010 chiller
o 10m chiller cable
• LN2 / Fluid / Heat Auto Changeover Unit
• 2x Non-hazardous gas line & mfc for use in a close coupled gas pod
• Standard Gas Pod externally mounted (8 lines max)
• 4x Standard gasline and MFC for non-hazardous gases
• Gas pod wall mounted
o 10m gas pod power cable
• Adixen ATH1600MT turbo
• ISO200 pipework
• Automatic Pressure Control & heated backing valve kit
• Pfeiffer A124H ELT pump kit
o 10m pump cable
• Chamber and pump down pipe Heating Kit
• PlasmaPro 100 Pumping Foreline Heating Kit
• PlasmaPro100 Single loadlock kit
• Roughing only to Dry Pump - Isolation Valve included
o Pfeiffer ACP15G dry pump kit
• PlasmaPro 100 ICP Etch system
o 208V 60Hz 3phase supply configuration
o 10m process chamber cable
• PC & 22" monitor
• Chamber right hand build configuration
• UL build compliance (3rd Party Certification quoted separately)
Oxford Instruments is the sole manufacturer and distributor of the equipment and uses proprietary technology to integrate with existing equipment at OSU.
An entity may appeal this determination in accordance with OSU Standard 03-010. Section 5.17 no later than the closing date indicated on the website. Appeals must be submitted to Procurement, Contracts and Materials Management at procurement@oregonstate.edu by Friday, March 28, 2025 at 3:30 pm, PST. For additional information please contact Brian Kinsey by email at brian.kinsey@oregonstate.edu or by telephone at (541) 737-1027.
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